Nitrogen doping in low temperature halo-carbon homoepitaxial growth of 4H-silicon carbide
CommitteeWinton, S. Raymond
With the low-temperature halo-carbon epitaxial growth technique developed at MSU prior to this work, use of a halo-carbon growth precursor enabled low-temperature homoepitaxial process for 4H-SiC at temperatures below 1300 °C with good quality. Investigations of the nitrogen doping dependence are reported. It has been demonstrated that the efficiency of the nitrogen incorporation may be different for different substrate orientations, with the C-face showing the higher value of doping. The Si/C ratio is known to influence the doping during the epitaxial growth due to the site-competition mechanism. The doping on the C-face showed weak dependence on the Si/C ratio. On the Si-face, the doping dependence follows the site-competition trend. At high Si/C ratio, the doping trend on Si-face shows strong deviation. Both of the investigated trends are suggested for use as the main process dependencies for achieving a wide range of n type doping of SiC during the low-temperature halo-carbon homoepitaxial process.